Rate coefficient for self-association reaction of CF2 radicals determined in the afterglow of low-pressure C4F8 plasmas

Plasma Chemistry and Plasma Processing

Volumn 21, Issue 1, 2001, Pages 139-147

  Suzuki, C ^a,b   Sasaki, K ^a   Kadota, K ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

Author keywords

C4F8; CF2; Plasma; Radical; Rate coefficient; Second order decay; Self association

Indexed keywords

EID: 0035531190     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1007097513722     Document Type: Article

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