Lifetime measurements of CFx radicals and H atoms in afterglow of CF4/H2 plasmas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 9 A, 1998, Pages 5047-5048

  Sasaki, Koichi ^a   Usui, Kenichiro ^a   Furukawa, Hiroyuki ^a   Suzuki, Chihiro ^a   Kadota, Kiyoshi ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Afterglow; CF4 H2 plasmas; CFx radicals; H atom; Lifetime; Reaction between CFx and H; Surface loss probability

Indexed keywords

ELECTRIC VARIABLES MEASUREMENT; GLOW DISCHARGES; HYDROGEN; PHASE DIAGRAMS; PLASMA DENSITY; REACTION KINETICS;

GAS PHASE REACTIONS; LIFETIME MEASUREMENT; RADICALS; SURFACE LOSS PROBABILITY;

PLASMAS;

EID: 0032156059     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.5047     Document Type: Article

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