EB stepper-a high throughput electron-beam projection lithography system

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 6897-6901

  Yamaguchi, Takeshi ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Curvilinear variable axis lens (CVAL); Electron beam (EB); Electron projection lithography (EPL); Next generation lithography (NGL); Projection reduction exposure with variable axis immersion lens (PREVAIL); Scattering contrast

Indexed keywords

ELECTRON OPTICS; OPTICAL INSTRUMENT LENSES;

CURVILINEAR VARIABLE AXIS LENS (CVAL); ELECTRON BEAM (EB) STEPPERS; ELECTRON PROJECTION LITHOGRAPHY (EPL); NEXT-GENERATION LITHOGRAPHY (NGL); PROJECTION REDUCTION EXPOSURE WITH VARIABLE AXIS IMMERSION LENS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034428641     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6897     Document Type: Article

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