Impurity-free intermixing of GaAs/AIGaAs quantum wells using SiOx capping: Effect of nitrous oxide flow rate

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 5, 2001, Pages 1962-1966

  Deenapanray, Prakash N K ^a   Jagadish, C ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; DIFFUSION; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HETEROJUNCTIONS; HYDROGEN; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING FILMS; SEMICONDUCTING GALLIUM ARSENIDE; SILANES;

ENERGY SHIFT; QUANTUM WELL INTERMIXING;

SEMICONDUCTOR QUANTUM WELLS;

EID: 0035439930     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (35)

1. See, for example, Semiconductor Quantum Wells Intermixing, Optoelectronic Properties of Semiconductors and Superlattices, Vol. 8, edited by E. H. Li (Gordon and Breach, Amsterdam, 2000);
2. Quantum Well Intermixing for Photonics, edited by E. H. Li (SPIE, Bellinghatn, WA, 1997).
3. J. H. Marsh, Semicond. Sci. Technol. 8, 1136 (1993).
4. A. C. Bryce, F. Camacho, E. A. Avrutin, and J. H. Marsh, IEEE J. Quantum Electron. 33, 1784 (1997).
5. Y. Nagai, K. Shigihara, S. Karakida, S. Karimoto, M. Otsubo, and K. Ikeda, IEEE J. Quantum Electron. 31, 1364 (1995).
6. D. Hofstetter, H. P. Zappe, J. E. Epler, and P. Riel, Appl. Phys. Lett. 67, 1978 (1995).
7. S. Y. Hu, M. G. Peters, D. B. Young, A. C. Gossard, and L. A. Coldren, IEEE Photonics Technol. Lett. 7, 712 (1995).
8. N. Yamada and J. S. Harris, Jr., Appl. Phys. Lett. 60, 2463 (1992).
9. A. Saher Helmy, J. S. Aitchison, and J. H. Marsh, Appl. Phys. Lett. 71, 2998 (1997).
10. D. G. Deppe and N. Holonyak, Jr., J. Appl. Phys. 64, R93 (1988).
11. H. H. Tan, J. S. Williams, C. Jagadish, P. T. Burke, and M. Gal, Appl. Phys. Lett. 68, 2401 (1996).
12. D. G. Deppe, L. J. Guido, N. Holonyak, Jr., K. C. Hsieh, R. D. Burnham, R. L. Thorton, and T. L. Paoli, Appl. Phys. Lett. 49, 510 (1986).
13. A. C. Bryce, F. Camacho, P. Cusumano, and J. H. Marsh, IEEE J. Sel. Top. Quantum Electron. 3, 885 (1997).
14. S. Bürkner, M. Maier, E. C. Larkins, W. Rothermound, E. P. O'Reilly, and J. D. Ralston, J. Electron. Mater. 24, 805 (1995).
15. I. Gontijo, T. Krauss, J. H. Marsh, and R. M. De La Rue, IEEE J. Quantum Electron. 30, 1189 (1994).
16. R. M. Cohen, G. Li, C. Jagadish, P. T. Burke, and M. Gal, Appl. Phys. Lett. 73, 803 (1998).
17. S. Yuan et al., J. Appl. Phys. 83, 1305 (1998).
18. H. Ribot, K. W. Lee, R. J. Simes, R. H. Yan, and L. A. Coldren, Appl. Phys. Lett. 55, 672 (1989).
19. E. L. Allen, C. J. Pass, M. D. Deal, J. D. Plummer, and V. F. K. Chia, Appl. Phys. Lett. 59, 3252 (1991).
20. W. J. Choi et al., IEEE J. Sel. Top. Quantum Electron. 4, 624 (1998).
21. A. Pépin, C. Vieu, M. Schneider, H. Launois, and Y. Nissim, J. Vac. Sci. Technol. B 15, 142 (1997).
22. R. M. Cohen, Mater. Sci. Eng., R. 20, 167 (1997).
23. A. Saher Helmy, S. K. Murad, A. C. Bryce, J. S. Aitchison, J. H. Marsh, S. E. Hicks, and C. D. W. Wilkinson, Appl. Phys. Lett. 74, 732 (1999).
24. L. Fu, P. N. K. Deenapanray, H. H. Tan, C. Jagadish, L. V. Dao, and M. Gal, Appl. Phys. Lett. 76, 837 (2000).
25. P. N. K. Deenapanray, H. H. Tan, J. Lengyel, A. Durandet, M. Gal, and C. Jagadish, in Proceedings of the 1998 Conference on Optoelectronic and Microelectronic Materials and Devices, edited by L. Faraone, J. M. Dell, T. A. Fischer, C. A. Musca, and B. D. Nener (IEEE, New Jersey, 1999), p. 361.
26. P. N. K. Deenapanray, J. Lengyel, H. H. Tan, C. Jagadish, M. Petravic, A. Durandet, and J. S. Williams, Mater. Res. Soc. Symp. Proc. 555, 197 (1999).
27. P. N. K. Deenapanray, H. H. Tan, L. Fu, and C. Jagadish, Electrochem. Solid-State Lett. 3, 196 (2000).
28. P. N. K. Deenapanray, H. H. Tan, and C. Jagadish, Mater. Res. Soc. Symp. Proc. 607, 491 (2000).
29. P. N. K. Deenapanray, H. H. Tan, M. I. Cohen, K. Gaff, M. Petravic, and C. Jagadish, J. Electrochem. Soc. 147, 1950 (2000).
30. W. J. Choi et al., Appl. Phys. Lett. 67, 3438 (1995).
31. P. N. K. Deenapanray, H. H. Tan, C. Jagadish, and F. D. Auret, Appl. Phys. Lett. 77, 696 (2000).
32. P. N. K. Deenapanray, H. H. Tan, C. Jagadish, and F. D. Auret, J. Appl. Phys. 88, 5255 (2000).
33. D. V. Tsu, G. Lucovsky, and M. J. Mantini, J. Vac. Sci. Technol. A 5, 1998 (1987).
34. W. A. Lanford and M. J. Rand, J. Appl. Phys. 49, 2473 (1978).
35. P. N. K. Deenapanray and C. Jagadish, Electrochem. Solid-State Lett. 4, G11 (2001).