Characterization of low-temperature PECVD silicon dioxide films

Materials Research Society Symposium - Proceedings

Volumn 555, Issue , 1999, Pages 197-202

  Deenapanray, P N K ^a   Lengyel, J ^b   Tan, H H ^a   Petravic, M ^a   Durandet, A ^a   Williams, J S ^a   Jagadish, C ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b ECOLE POLYTECHNIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR QUANTUM WELLS; SILICA; SUBSTRATES;

IMPURITY FREE VACANCY DIFFUSION; SILICON DIOXIDE FILMS;

THIN FILMS;

EID: 0032591061     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

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