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Volumn 4, Issue 2, 2001, Pages
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Effect of stress on impurity-free quantum well intermixing
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
ELLIPSOMETRY;
EPITAXIAL GROWTH;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HETEROJUNCTIONS;
IMPURITIES;
PHOTOLUMINESCENCE;
RAPID THERMAL ANNEALING;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING SILICON COMPOUNDS;
BLUE SHIFT;
CAPPING LAYER;
IMPURITY-FREE VACANCY INTERDIFFUSION;
INTERDIFFUSION;
INTERMIXING;
SPECTROSCOPIC ELLIPSOMETRY;
SEMICONDUCTOR QUANTUM WELLS;
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EID: 0035262735
PISSN: 10990062
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1339242 Document Type: Article |
Times cited : (25)
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References (23)
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