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Volumn 227-228, Issue , 2001, Pages 521-526
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Molecular beam epitaxy of GaInNAs by using solid source arsenic
a
HITACHI LTD
(Japan)
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Author keywords
A3. Molecular beam epitaxy; B2. Semiconducting III V materials; B3. Laser diodes
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Indexed keywords
ANNEALING;
ARSENIC;
HYDROGEN;
INTERFACES (MATERIALS);
MOLECULAR BEAM EPITAXY;
PHOTOLUMINESCENCE;
SEMICONDUCTOR LASERS;
SOLID-SOURCE MOLECULAR BEAM EPITAXY;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 0035398124
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(01)00759-X Document Type: Conference Paper |
Times cited : (24)
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References (15)
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