Towards sub-10 nm carrier profiling with spreading resistance techniques

Materials Science in Semiconductor Processing

Volumn 4, Issue 1-3, 2001, Pages 61-66

  Clarysse, T ^a   Eyben, P ^a   Hantschel, T ^a   Vandervorst, W ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC RESISTANCE; THERMOANALYSIS;

CARRIER PROFILING; SPREADING RESISTANCE (SP);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0035247209     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(00)00156-6     Document Type: Article

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