High-resolution constant-height imaging with apertured silicon cantilever probes

Journal of Microscopy

Volumn 202, Issue 1, 2001, Pages 22-27

  Dziomba, T ^a,c   Danzebrink, H U ^a   Lehrer, C ^a   Frey, L ^a   Sulzbach, T ^b   Ohlsson, O ^b  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^c Nanosensors Dr Olaf Wolter GmbH   (Germany)

Author keywords

Atomic force microscopy (AFM); Constant height imaging; Focused ion beam technique (FIB); Scanning near field optical microscopy (SNOM)

Indexed keywords

FOCUSED ION BEAMS; GEOMETRICAL OPTICS; INFRARED DEVICES; NANOCANTILEVERS; NEAR FIELD SCANNING OPTICAL MICROSCOPY; PROBES; SILICON;

APERTURED; ATOMIC FORCE MICROSCOPY; ATOMIC FORCE MICROSCOPY CANTILEVERS; ATOMIC-FORCE-MICROSCOPY; CONSTANT-HEIGHT IMAGING; FOCUSED ION BEAM TECHNIQUE; HIGH RESOLUTION; SCANNING NEAR-FIELD OPTICAL MICROSCOPY;

ATOMIC FORCE MICROSCOPY;

ALUMINUM;

CONFERENCE PAPER; DIFFRACTION; INFRARED RADIATION; LASER; OPTICAL RESOLUTION; OPTICS; PRIORITY JOURNAL; SCANNING NEAR FIELD OPTICAL MICROSCOPY; SIGNAL PROCESSING; STANDARD; TECHNIQUE;

EID: 0035061903     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.2001.00858.x     Document Type: Conference Paper

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