Nano-slit probes for near-field optical microscopy fabricated by focused ion beams

Journal of Microscopy

Volumn 194, Issue 2-3, 1999, Pages 335-339

  Danzebrink, H U ^a   Dziomba, Th ^a   Sulzbach, T ^b   Ohlsson, O ^b   Lehrer, C ^c   Frey, L ^c  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b Nanosensors GmbH   (Germany)

^c Fraunhofer Inst Integrierte SB   (Germany)

Author keywords

Atomic force microscopy; Focused ion beam technique; Infrared microscopy; Nano slit near field probes; Scanning near field optical microscopy

Indexed keywords

FOCUSED ION BEAMS; GOLD DEPOSITS; IONS; NEAR FIELD SCANNING OPTICAL MICROSCOPY; OPTICAL DATA STORAGE; PROBES; SILICON WAFERS;

ATOMIC-FORCE-MICROSCOPY; FOCUSED ION BEAM TECHNIQUE; FOCUSED IONS BEAMS; INFRARED MICROSCOPY; NANO-SLIT NEAR-FIELD PROBE; NANOSLITS; NEAR FIELD OPTICAL MICROSCOPY; NEAR FIELD PROBES; SCANNING NEAR-FIELD OPTICAL MICROSCOPY; SLIT PROBES;

ATOMIC FORCE MICROSCOPY;

CHROMIUM; GOLD; PALLADIUM; SILICON;

ATOMIC FORCE MICROSCOPY; CONFERENCE PAPER; DIFFRACTION; MICROSCOPE IMAGE; OPTICAL RESOLUTION; PRIORITY JOURNAL; RADIATION PHYSICS; SCANNING NEAR FIELD OPTICAL MICROSCOPY;

EID: 0032991869     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.1999.00505.x     Document Type: Conference Paper

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