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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 716-725

Scatterometry for shallow trench isolation (STI) process metrology

(4) Raymond, Christopher J a Littau, Mike a Markle, Rick b Purdy, Matthew b

a NANOMETRICS INC (United States)

b ADVANCED MICRO DEVICES (United States)

Author keywords

CD; Diffract; Metrology; Optical; Scatterometry; Shallow; STI; Trench

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION GRATINGS; ETCHING; NONDESTRUCTIVE EXAMINATION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON NITRIDE;

SCATTEROMETRY;

LIGHT SCATTERING;

EID: 0034768323 PISSN: 0277786X EISSN: None Source Type: Journal
DOI: 10.1117/12.436798 Document Type: Article

Times cited : (15)

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