Observations on the chemistry and physics of STI etch in Cl2-Ar plasmas

Solid State Technology

Volumn 43, Issue 12, 2000, Pages 87-88,-90,-92

  Werbaneth, Paul ^a   Almerico, John ^a  

^a Tegal Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISTRY; CHLORINE COMPOUNDS; ION BOMBARDMENT; MASKS; OXIDATION; PLASMA THEORY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR PLASMAS;

LOCAL OXIDATION OF SILICON; MICROLOADING; SHALLOW TRENCH ISOLATION;

PLASMA ETCHING;

EID: 0342903235     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (11)

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