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Volumn 22, Issue 4, 2000, Pages 227-233
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Semiconductor devices "from inside"
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Author keywords
Differential voltage contrast; Doping profiles; Electrical field profile; Semiconductor devices
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Indexed keywords
ARTICLE;
DEVICE;
ELECTRIC FIELD;
ELECTRIC POTENTIAL;
IMAGE ENHANCEMENT;
IMAGE PROCESSING;
PRIORITY JOURNAL;
SEMICONDUCTOR;
ELECTRIC POTENTIAL;
ELECTRON BEAMS;
FERMI LEVEL;
IMAGING TECHNIQUES;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR DOPING;
DIFFERENTIAL VOLTAGE CONTRAST (DVC);
QUASI-FERMI ENERGY (QFE);
SECONDARY ELECTRON IMAGING;
SEMICONDUCTOR DEVICES;
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EID: 0034492797
PISSN: 01610457
EISSN: None
Source Type: Journal
DOI: 10.1002/sca.4950220401 Document Type: Article |
Times cited : (8)
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References (19)
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