Secondary electrons imaging of metal-semiconductor field-effect transistor operation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 437-439

  Mil'shtein, S ^a   Kharas, D ^a   Lee, C ^a   Ersland, P ^b  

^a UNIVERSITY OF MASSACHUSETTS   (United States)

^b M/A COM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002908381     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588490     Document Type: Article

References (9)

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4. J. T. Thong, Electron Beam Testing Technology (Plenum, New York, 1994), pp. 84-97.
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7. A. Gopinath, K. Gopinath, and P. Thomas, in Proceedings of the Xth Scanning Electron Microscope Conference, 1978, Vol. 1, p. 375.
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9. S. Mil'shtein, D. Kharas, S. Iatrou, and K. Gray, in Proceedings of the 22nd Conference on Physical Semiconductors, 1995, Vol. 2, p. 465.