Proximity effect correction by the GHOST method using a scattering stencil mask

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2860-2863

  Yamashita, Hiroshi ^a   Nomura, Eiichi ^a   Manako, Shoko ^a   Kobinata, Hideo ^a   Nakajima, Ken ^a   Nozue, Hiroshi ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033259664     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591084     Document Type: Article

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