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Volumn 39, Issue 12 B, 2000, Pages 6908-6913

Critical-dimension controllability of chemically amplified resists for X-ray membrane mask fabrication

Author keywords

100 kV; Chemically amplified resist; Critical dimension; EB mask writer; Post exposure bake; Resist; X ray membrane mask

Indexed keywords

INTEGRATED CIRCUIT LAYOUT; MASKS; PHOTORESISTS; ULSI CIRCUITS; X RAY LITHOGRAPHY;

EID: 0034427843     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6908     Document Type: Article
Times cited : (3)

References (15)
  • 9
    • 33645039472 scopus 로고    scopus 로고
    • Semiconductor Equipment and Materials International (SEMI) Draft Document 2358
    • Semiconductor Equipment and Materials International (SEMI) Draft Document 2358.
  • 11
    • 33645043282 scopus 로고    scopus 로고
    • GRYSET is a registered trademark of Karl Suss automated spin coater system
    • GRYSET is a registered trademark of Karl Suss automated spin coater system.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.