![]() |
Volumn 39, Issue 12 B, 2000, Pages 6908-6913
|
Critical-dimension controllability of chemically amplified resists for X-ray membrane mask fabrication
a
NTT CORPORATION
(Japan)
|
Author keywords
100 kV; Chemically amplified resist; Critical dimension; EB mask writer; Post exposure bake; Resist; X ray membrane mask
|
Indexed keywords
INTEGRATED CIRCUIT LAYOUT;
MASKS;
PHOTORESISTS;
ULSI CIRCUITS;
X RAY LITHOGRAPHY;
CHEMICALLY AMPLIFIED RESISTS;
CRITICAL DIMENSIONS (CD);
ELECTRON BEAM MASK WRITERS;
ELECTRON BEAM LITHOGRAPHY;
|
EID: 0034427843
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.39.6908 Document Type: Article |
Times cited : (3)
|
References (15)
|