Highly sensitive and stress-free chemically amplified negative working resist, TDUR-N9, for 0.1 μm synchrotron radiation (SR) lithography

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 1 B, 1996, Pages

  Tsuboi, Shinji ^a   Yamashita, Yoshio ^a   Mitsui, Soichiro ^a  

^a SORTEC Corp   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; STRESS ANALYSIS; SYNCHROTRON RADIATION;

CHEMICALLY AMPLIFIED NEGATIVE WORKING RESISTS; PATTERN DEFORMATION; PATTERN REPLICATION; SYNCHROTRON RADIATION LITHOGRAPHY;

PHOTORESISTS;

EID: 0029753164     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l130     Document Type: Article

References (4)