Delineation performance of advanced 100 kV EB writer on X-ray membrane mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 105-112

  Nakayama, Y ^a   Aoyama, H ^a   Tsuboi, S ^a   Watanabe, H ^a   Kikuchi, Y ^a   Ezaki, M ^a   Matsui, Y ^a   Morosawa, T ^a   Saito, K ^a   Ohki, S ^a   Matsuda, T ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; INTERFEROMETERS; LASER APPLICATIONS; OPTICAL RESOLVING POWER; ULSI CIRCUITS; X RAY LITHOGRAPHY;

ELECTRON BEAM MASK WRITERS; LASER INTERFEROMETERS; X RAY MEMBRANE MASKS;

MASKS;

EID: 0033683278     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)