EB-X3: New electron-beam x-ray mask writer

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2907-2911

  Morosawa, Tetsuo ^a   Saito, Kenichi ^a   Takeda, Yuji ^a   Kunioka, Tatsuya ^a   Shimizu, Akira ^a   Kato, Junichi ^a   Matsuda, Tadahito ^a   Kuriyama, Youichi ^a,c   Nakayama, Yoshinori ^b   Matsui, Yasuji ^b  

^a NTT CORPORATION   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^c KYOCERA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033272491     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591094     Document Type: Article

References (7)

1. M. A. Sturans et al., J. Vac. Sci. Technol. B 16, 3164 (1998).
2. E. Tapley, XEL'98 Digest of Papers, 1998.
3. T. Morosawa, N. Shimazu, K. Saito, Y. Takeda, T. Kunioka, A. Shimizu, J. Kato, Y. Kuriyama, and T. Matsuda, in Ref. 2.
4. K. Saito, J. Kato, A. Shimizu, H. Morita, T. Matsuda, and Y. Nakayama, J. Vac. Sci. Technol. B, these proceedings.
5. T. Kunioka, Y. Takeda, N. Shimazu, T. Matsuda, and Y. Nakayama, J. Vac. Sci. Technol. B, these proceedings.
6. S. Uchiyama, S. Ohki, A. Ozawa, M. Oda, T. Matsuda, and T. Morosawa Jpn. J. Appl. Phys., Part 1 34, 6743 (1995).
7. S. Uchiyama, M. Oda, and T. Matsuda J. Vac. Sci. Technol. B 14, 4332 (1996).