X-ray stepper development for volume production at Canon

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 689-697

  Uda, Kouji ^a   Mizusawa, Nobutoshi ^a   Tanaka, Yutaka ^a   Watanabe, Yutaka ^a   Ina, Hideki ^a   Uzawa, Shunichi ^a  

^a CANON INC   (Japan)

Author keywords

Alignment; Full field exposure; Magnification correction; Proximity gap; SR stepper; X ray lithography

Indexed keywords

CONTROLLABILITY; MASKS; MIRRORS; SILICA;

MAGNIFICATION CORRECTION;

X RAY LITHOGRAPHY;

EID: 0032402409     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309632     Document Type: Conference Paper

References (1)

1. Overlay accuracy of Canon synchrotron radiation stepper XFPA for 0.15μm process