EL5: One tool for advanced x-ray and chrome on glass mask making

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3164-3167

  Sturans, M A ^a   Hartley, J G ^a   Pfeiffer, H C ^a   Dhaliwal, R S ^a   Groves, T R ^a   Pavick, J W ^a   Quickle, R J ^a   Clement, C S ^a   Dick, G J ^a   Enichen, W A ^a   Gordon, M S ^a   Kendall, R A ^a   Kostek, C A ^a   Pinckney, D J ^a   Robinson, C F ^a   Rockrohr, J D ^a   Safran, J M ^a   Senesi, J J ^a   Tressler, E V ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001171210     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590457     Document Type: Article

References (4)

1. R. A. Kendall, S. K. Doran, and E. E. Weissmann, J. Vac. Sci. Technol. B 9, 3019 (1991).
2. J. Goodberlet, J. Ferrera, and H. I. Smith, J. Vac. Sci. Technol. B 15, 2293 (1997).
3. K. F. Perkins, C. R. K. Marrian, and M. C. Peckerar, J. Vac. Sci. Technol. B 15, 2218 (1997).
4. G. J. Dick, A. S. Ganong, C. Lai, M. L. Merillat, and J. W. Pavick, J. Vac. Sci. Technol. B (these proceedings).