SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 133-134, Issue , 2000, Pages 606-611

Dry etch characteristics of Al-Nd films for TFT-LCD

(5) Han, H R a Lee, Y J a Yeom, G Y a Oh, K H b Hong, M P c

a Sungkyunkwan University (South Korea)

b Agency for Technology and Standards (South Korea)

c Samsung Advanced Institute of Technology (SAIT) (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ALLOYS; DEPOSITION; DRY ETCHING; ELECTRIC POTENTIAL; GLASS; LIQUID CRYSTAL DISPLAYS; MAGNETIZATION; PHOTORESISTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; THIN FILM TRANSISTORS; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY;

METALLIC FILMS;

ETCHING;

EID: 0034310647 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(00)00977-4 Document Type: Article

Times cited : (9)

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