Aluminum etch and after-corrosion characteristics in a m=0 helicon wave plasma etcher

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6928-6933

  Ha, Jae Hee ^a   Yim, Myoung Ho ^a   Kim, Jae Jeong ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Aluminum; Auger electron spectroscopy; Corrosion; Etching; Helicon; Ion chromatography; MORI; N2 addition; Source power

Indexed keywords

EID: 0006411186     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6928     Document Type: Article

References (7)

1. T. Tsukada, H. Nogami, Y. Nakagawa and E. Wani: Jpn. J. Appl. Phys. 33 (1994) 4433.
2. Y. Ra, S. G. Bradley and C. Chen: J. Vac. Sci. Technol. A 12 (1994) 1328.
3. C. B. Labelle, H. L. Maynard and J. T. C. Lee: J. Vac. Sci. Technol. B 14 (1996) 2574.
4. Rod Hill: J. Vac. Sci. Technol. B 14 (1996) 547.
5. PMT MORI is a trademark of Plasma and Materials Technologies, Inc.
6. P. Czuprynski, O. Joubert, M. Heitzmann, D. Louis, C. Vizioz and E. Lajoinie: J. Vac. Sci. Technol. B 15 (1997) 1000.
7. Y. Kusumi, N. Fujiwara, J. Matsumoto and M. Yoneda: Jpn. J. Appl. Phys. 34 (1995) 2147.