Study of shallow silicon trench etch process using planar inductively coupled plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 573-578

  Lee, Ju Hoon ^a   Yeom, Geun Young ^a   Lee, Ju Wook ^b   Lee, Jung Yong ^b  

^a Sungkyunkwan University   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000333071     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580686     Document Type: Article

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