-
1
-
-
0001499971
-
SOI for digital CMOS VLSI: Design considerations and advances
-
C.-T. Chuang, P.-F. Lu, and C. J. Anderson, "SOI for digital CMOS VLSI: Design considerations and advances," Proc. IEEE, vol. 86, pp. 689-720, 1998.
-
(1998)
Proc. IEEE
, vol.86
, pp. 689-720
-
-
Chuang, C.-T.1
Lu, P.-F.2
Anderson, C.J.3
-
2
-
-
0032074892
-
Fully-depleted SOI CMOS for analog applications
-
J.-P. Colinge, "Fully-depleted SOI CMOS for analog applications," IEEE Trans. Electron Devices, vol. 45, pp. 1010-1016, 1998.
-
(1998)
IEEE Trans. Electron Devices
, vol.45
, pp. 1010-1016
-
-
Colinge, J.-P.1
-
3
-
-
0033346696
-
1.5-v 1.8-GHz SOI low noise amplifiers for PCS receivers
-
W. Jin, C. H. Chan, and C. Hai, "1.5-V 1.8-GHz SOI low noise amplifiers for PCS receivers," in Proc. IEEE Int. SOI Conf., 1999, pp. 16-17.
-
(1999)
Proc. IEEE Int. SOI Conf.
, pp. 16-17
-
-
Jin, W.1
Chan, C.H.2
Hai, C.3
-
4
-
-
0033349875
-
Comparison between fully-and partially-depleted SOI MOSFET's for low-power radio-frequency applications
-
O. Rozeau et al., "Comparison between fully-and partially-depleted SOI MOSFET's for low-power radio-frequency applications," in Proc. IEEE Int. SOI Conf., 1999, pp. 22-23.
-
(1999)
Proc. IEEE Int. SOI Conf.
, pp. 22-23
-
-
Rozeau, O.1
-
5
-
-
0033359558
-
High frequency performance of a fully-depleted 0.25-μm SOI CMOS technology
-
D. D. Rathman et al., "High frequency performance of a fully-depleted 0.25-μm SOI CMOS technology," in IEEE Int. Microwave Symp. Dig., 1999, pp. 577-580.
-
(1999)
IEEE Int. Microwave Symp. Dig.
, pp. 577-580
-
-
Rathman, D.D.1
-
6
-
-
0032027787
-
0.15-μm RF CMOS technology compatible with logic CMOS for low-voltage operation
-
M. Saito et al., "0.15-μm RF CMOS technology compatible with logic CMOS for low-voltage operation," IEEE Trans. Electron Devices, vol. 45, pp. 737-742, 1998.
-
(1998)
IEEE Trans. Electron Devices
, vol.45
, pp. 737-742
-
-
Saito, M.1
-
7
-
-
0032123928
-
High-frequency performance of a partially depleted 0.18-μm SOI/CMOS technology at low supply voltage-influence of parasitic elements
-
V. Ferlet-Cavrois et al., "High-frequency performance of a partially depleted 0.18-μm SOI/CMOS technology at low supply voltage-influence of parasitic elements," IEEE Electron Device Lett., vol. 19, pp. 265-267, 1998.
-
(1998)
IEEE Electron Device Lett.
, vol.19
, pp. 265-267
-
-
Ferlet-Cavrois, V.1
-
8
-
-
0033339639
-
An 80 nm dual-gate CMOS with shallow extensions formed after activation annealing and SALICIDE
-
E. Morifuji et al., "An 80 nm dual-gate CMOS with shallow extensions formed after activation annealing and SALICIDE," in IEDM Tech. Dig., 1999, pp. 649-652.
-
(1999)
IEDM Tech. Dig.
, pp. 649-652
-
-
Morifuji, E.1
-
9
-
-
0033314089
-
RF potential of a 0.18-μm CMOS logic technology
-
J. N. Burghartz et al., "RF potential of a 0.18-μm CMOS logic technology," in IEDM Tech. Dig., 1999, pp. 853-856.
-
(1999)
IEDM Tech. Dig.
, pp. 853-856
-
-
Burghartz, J.N.1
-
10
-
-
0033325344
-
T SiGe HBT biCMOS, ASIC-compatible, copper interconnect technology for RF and microwave applications
-
T SiGe HBT biCMOS, ASIC-compatible, copper interconnect technology for RF and microwave applications," in IEDM Tech. Dig., 1999, pp. 569-572.
-
(1999)
IEDM Tech. Dig.
, pp. 569-572
-
-
Freeman, G.1
-
11
-
-
0030379801
-
Self-heating effects in SOI MOSFET's and their measurement by small signal conductance techniques
-
B. M. Tenbroek et al., "Self-heating effects in SOI MOSFET's and their measurement by small signal conductance techniques," IEEE Trans. Electron Devices, vol. 43, pp. 2240-2248, 1996.
-
(1996)
IEEE Trans. Electron Devices
, vol.43
, pp. 2240-2248
-
-
Tenbroek, B.M.1
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