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Volumn 21, Issue 10, 2000, Pages 497-499

High-frequency characterization of sub-0.25-μm fully depleted silicon-on-insulator MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

EQUIVALENT CIRCUITS; INTEGRATED CIRCUIT LAYOUT; SILICON ON INSULATOR TECHNOLOGY;

EID: 0034298211     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.870613     Document Type: Article
Times cited : (12)

References (11)
  • 1
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    • Chuang, C.-T.1    Lu, P.-F.2    Anderson, C.J.3
  • 2
    • 0032074892 scopus 로고    scopus 로고
    • Fully-depleted SOI CMOS for analog applications
    • J.-P. Colinge, "Fully-depleted SOI CMOS for analog applications," IEEE Trans. Electron Devices, vol. 45, pp. 1010-1016, 1998.
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    • Colinge, J.-P.1
  • 3
    • 0033346696 scopus 로고    scopus 로고
    • 1.5-v 1.8-GHz SOI low noise amplifiers for PCS receivers
    • W. Jin, C. H. Chan, and C. Hai, "1.5-V 1.8-GHz SOI low noise amplifiers for PCS receivers," in Proc. IEEE Int. SOI Conf., 1999, pp. 16-17.
    • (1999) Proc. IEEE Int. SOI Conf. , pp. 16-17
    • Jin, W.1    Chan, C.H.2    Hai, C.3
  • 4
    • 0033349875 scopus 로고    scopus 로고
    • Comparison between fully-and partially-depleted SOI MOSFET's for low-power radio-frequency applications
    • O. Rozeau et al., "Comparison between fully-and partially-depleted SOI MOSFET's for low-power radio-frequency applications," in Proc. IEEE Int. SOI Conf., 1999, pp. 22-23.
    • (1999) Proc. IEEE Int. SOI Conf. , pp. 22-23
    • Rozeau, O.1
  • 5
    • 0033359558 scopus 로고    scopus 로고
    • High frequency performance of a fully-depleted 0.25-μm SOI CMOS technology
    • D. D. Rathman et al., "High frequency performance of a fully-depleted 0.25-μm SOI CMOS technology," in IEEE Int. Microwave Symp. Dig., 1999, pp. 577-580.
    • (1999) IEEE Int. Microwave Symp. Dig. , pp. 577-580
    • Rathman, D.D.1
  • 6
    • 0032027787 scopus 로고    scopus 로고
    • 0.15-μm RF CMOS technology compatible with logic CMOS for low-voltage operation
    • M. Saito et al., "0.15-μm RF CMOS technology compatible with logic CMOS for low-voltage operation," IEEE Trans. Electron Devices, vol. 45, pp. 737-742, 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , pp. 737-742
    • Saito, M.1
  • 7
    • 0032123928 scopus 로고    scopus 로고
    • High-frequency performance of a partially depleted 0.18-μm SOI/CMOS technology at low supply voltage-influence of parasitic elements
    • V. Ferlet-Cavrois et al., "High-frequency performance of a partially depleted 0.18-μm SOI/CMOS technology at low supply voltage-influence of parasitic elements," IEEE Electron Device Lett., vol. 19, pp. 265-267, 1998.
    • (1998) IEEE Electron Device Lett. , vol.19 , pp. 265-267
    • Ferlet-Cavrois, V.1
  • 8
    • 0033339639 scopus 로고    scopus 로고
    • An 80 nm dual-gate CMOS with shallow extensions formed after activation annealing and SALICIDE
    • E. Morifuji et al., "An 80 nm dual-gate CMOS with shallow extensions formed after activation annealing and SALICIDE," in IEDM Tech. Dig., 1999, pp. 649-652.
    • (1999) IEDM Tech. Dig. , pp. 649-652
    • Morifuji, E.1
  • 9
    • 0033314089 scopus 로고    scopus 로고
    • RF potential of a 0.18-μm CMOS logic technology
    • J. N. Burghartz et al., "RF potential of a 0.18-μm CMOS logic technology," in IEDM Tech. Dig., 1999, pp. 853-856.
    • (1999) IEDM Tech. Dig. , pp. 853-856
    • Burghartz, J.N.1
  • 10
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    • T SiGe HBT biCMOS, ASIC-compatible, copper interconnect technology for RF and microwave applications
    • T SiGe HBT biCMOS, ASIC-compatible, copper interconnect technology for RF and microwave applications," in IEDM Tech. Dig., 1999, pp. 569-572.
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  • 11
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    • Tenbroek, B.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.