Plasma properties determined with induction loop probes in a planar inductively coupled plasma source

Journal of Applied Physics

Volumn 79, Issue 3, 1996, Pages 1298-1302

  Meyer, J A ^a,b   Mau, R ^a   Wendt, A E ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b Tegal Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008194617     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361025     Document Type: Article

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