Advanced micromachined fermentation monitoring device

Sensors and Actuators, B: Chemical

Volumn 68, Issue 1, 2000, Pages 281-285

  Kalinowski, T ^a   Rittersma, Z M ^a   Benecke, W ^a   Binder, J ^a  

^a UNIVERSITY OF BREMEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BIOLOGICAL MEMBRANES; BIOMASS; CELLS; DIELECTRIC PROPERTIES; ELECTRIC VARIABLES MEASUREMENT; FERMENTATION; FLUIDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROUS SILICON; ULTRASONIC CLEANING;

COMB ELECTRODES; DIELECTRIC MEASUREMENT; MICROMACHINED FERMENTATION MONITORING DEVICE;

MICROELECTRODES;

EID: 0034247137     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(00)00445-7     Document Type: Article

References (21)

1. Munro W.A., Thomas C.L.P., Simpson I., Shaw, Dodgson J. Deterioration of pH electrode response due to biofilm formation on the glass membrane. Sens. Actuators, B. 37:1996;187-194.
2. Oehme F. Dieletrische Meßmethoden. 1962;Verlag Chemie.
3. Hasted J.B. Aqueous Dielectrics. 1973;Chapman & Hall.
4. Schanne O.F. Impedance Measurements in Biological Cells. 1978;Wiley.
5. Stoffel A., Kovács A., Kronast W., Müller B. LPCVD against PECVD for micromechanical application. J. Micromech. Microeng. 6:1996;1-13.
6. Scheeper P.R., Voorthuyzen J.A., Bergveld P. PECVD silicon nitride diaphragms for condenser microphones. Sens. Actuators, B. 4:1991;79-84.
7. Kronast W., Müller B., Seidel W., Stoffel A. Single-chip condenser microphone using porous silicon as sacrificial layer for the air gap. MEMS 98, Heidelberg, Germany. 1998;591.
8. Kaltas G., Nassiopoulou A., Nassiopoulou G. Frontside bulk silicon micromachining porous silicon technology. Sens. Actuators, A. 65:1998;175-179.
9. Brand O., Hornung M., Baltes H., Hafner C. Ultrasound barrier microsystem for object detection based on micromachined transducer elements. J. Micromech. Syst. 6(2):1997;151.
10. Hornung M., Brand O., Baltes H. Optimization of micromachined ultrasound transducer by finite element simulation. Eurosensors IX, Stockholm, Sweden. 1995;620.
11. Pedersen M., Olthuis W., Bergveld P. Development and fabrication of capacitive sensors in polyimide. Sens. Mater. 10(1):1998;1-20.
12. Pedersen M., Olthuis W., Bergveld P. Fabrication of IC-compatible capacitive sensors by polymer processing. Proc. SPIE. 3042:1997;70-81.
13. Inoue K., Suzuki Y., Ogawa S. Fabrication of ultrasonic sensor using silicon membrane. Transducers 95. 2:1995;616-619.
14. Soh H.T., Ladabaum I., Atalar A., Quate C.F., Khuri-Yabub T. Silicon micromachined ultrasonic immersion transducers. Appl. Phys. Lett. 69(24):1996;3674. 9 December.
15. Schindel D.W., Hutchins D.A., Zou L., Sayer M. The design and characterisation of micromachined air-coupled capacitance transducers. IEEE Trans. Ultrason., Ferroelectr. Frequency Control. 42(1):1995;42. January.
16. Haller M.I., Khuri-Yabuk B.T. A surface micromachined electrostatic ultrasonic air transducer. IEEE Trans. Ultrason., Ferroelectr. Frequency Control. 43(1):1996;1. January.
17. Scheeper P.R., van der Donk A.G.H., Olthuis W., Bergveld P. A review of silicon microphones. Sens. Actuators, A. 44:1994;1-11.
18. Ning Y.B., Mitchel A.W., Tait R.N. Fabrication of a silicon micromachined capacitive microphone using a dry etch-process. Sens. Actuators, A. 53:1996;237-242.
19. Cunningham B.T., Bernstein J. Wide bandwidth silicon nitride membrane microphone. Proc. SPIE. 3223:1997;56-63.
20. Horwath P., Erlebach A., Köhler R., Kück H. Miniature condenser microphone with a thin silicon membrane fabricated on SIMOX substrate. Transducers 95. 2:1995;696.
21. Bernstein J., Weinberg M. Advanced micromachined condenser hydrophone. Tech. Digest - Solid States Sens. Actuators Workshop. XVI:1994;73.