Wide bandwidth silicon nitride membrane microphones

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3223, Issue , 1997, Pages 56-63

  Cunningham, Brian T ^a   Bernstein, Jonathan J ^a  

^a CHARLES STARK DRAPER LABORATORY   (United States)

Author keywords

Corrugated membrane; Micromachined microphone; Silicon nitride membrane

Indexed keywords

AMPLIFIER CIRCUITRIES; AMPLIFIER CIRCUITS; BACK PLATES; CHEMICAL VAPOR DEPOSITED; COMMUNICATION LINKS; CORRUGATED MEMBRANE; FABRICATION PROCESSES; HIGH OUTPUTS; HIGH SENSITIVITIES; JFET AMPLIFIERS; LOW COSTS; LOW STRESSES; LOW TEMPERATURES; MAXIMUM TEMPERATURES; MICROMACHINED MICROPHONE; NOISE SPECTRAL DENSITIES; ONCHIP CIRCUITRIES; PLANARITY; PROCESS COMPATIBILITIES; SILICON DIAPHRAGMS; SILICON NITRIDE DEPOSITIONS; SILICON NITRIDE MEMBRANE; STRAY CAPACITANCES; TRANSISTOR CHARACTERISTICS; VOLTAGE SENSITIVITIES; WIDE BANDWIDTHS;

ACOUSTIC IMAGING; CAPACITANCE; COMPOSITE MICROMECHANICS; DIAPHRAGMS; FABRICATION; FREQUENCY RESPONSE; MACHINING; MEMBRANES; MICROANALYSIS; MICROFABRICATION; MICROMACHINING; MICROPHONES; NITRIDES; NONMETALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILICON NITRIDE; TENSILE STRENGTH; ULTRASONIC IMAGING; ULTRASONICS;

SILICON WAFERS;

EID: 0343647352     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284500     Document Type: Conference Paper

References (3)

1. J.J. Bernstein, and J.T. Borenstein, "A Micromachined Silicon Condenser Microphone With On-Chip Amplifier," Proceedings of the 1996 Solid State Sensor and Actuator Workshop, Hilton Head, SC, pp. 239-243.
2. P.R. Scheeper, J.A. Voorthuyzen, and P. Bergveld, "PECVD Silicon Nitride Diaphragms for Condenser Microphones," Sensors and Actuators A, 32, 1992, pp. 560-564.
3. L.E. Kinsler, A.R. Frey, A.B. Coppens, and J.V. Sanders, Fundamentals of Acoustics, Third Edition, John Wiley and Sons, New York, 1982.