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Volumn 53, Issue 1-3, 1996, Pages 237-242

Fabrication of a silicon micromachined capacitive microphone using a dry-etch process

Author keywords

Capacitive microphones; Dry etching; Micromachining; Silicon

Indexed keywords


EID: 0004538916     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/0924-4247(96)01130-2     Document Type: Article
Times cited : (31)

References (16)
  • 2
    • 0026117974 scopus 로고
    • Silicon condenser microphone with integrated field effect transistor
    • W. Kuhnel, Silicon condenser microphone with integrated field effect transistor, Sensors and Actuators A, 25-27 (1991) 521-525.
    • (1991) Sensors and Actuators A , vol.25-27 , pp. 521-525
    • Kuhnel, W.1
  • 3
    • 0027614542 scopus 로고
    • Silicon membrane condenser microphone with integrated field-effect transistor
    • E. Graf, W. Kronast, S. Dühring, B. Müller and A. Stoffel, Silicon membrane condenser microphone with integrated field-effect transistor, Sensors and Actuators A, 37-38 (1993) 708-711.
    • (1993) Sensors and Actuators A , vol.37-38 , pp. 708-711
    • Graf, E.1    Kronast, W.2    Dühring, S.3    Müller, B.4    Stoffel, A.5
  • 6
    • 0026852788 scopus 로고
    • A silicon subminiature microphone based on piezoresistive polysilicon strain gauges
    • R. Schellin and G. Hess, A silicon subminiature microphone based on piezoresistive polysilicon strain gauges, Sensors and Actuators A, 32 (1992) 555-559.
    • (1992) Sensors and Actuators A , vol.32 , pp. 555-559
    • Schellin, R.1    Hess, G.2
  • 7
    • 0026854694 scopus 로고
    • Micromachined subminiature condenser microphones in silicon
    • W. Kuhnel and G. Hess, Micromachined subminiature condenser microphones in silicon, Sensors and Actuators A, 32 (1992) 560-564.
    • (1992) Sensors and Actuators A , vol.32 , pp. 560-564
    • Kuhnel, W.1    Hess, G.2
  • 12
    • 0028447327 scopus 로고
    • Capacitive microphone with a surface micromachined backplate using electroplating technology
    • J. Bergqvist and J. Gobet, Capacitive microphone with a surface micromachined backplate using electroplating technology, IEEE J. Microelectromech. Syst., 3 (1994) 69-75.
    • (1994) IEEE J. Microelectromech. Syst. , vol.3 , pp. 69-75
    • Bergqvist, J.1    Gobet, J.2
  • 13
    • 0028392919 scopus 로고
    • Improvement of the performance of microphones with a silicon nitride diaphragm and backplate
    • P.R. Scheeper, W. Olthuis and P. Bergveld, Improvement of the performance of microphones with a silicon nitride diaphragm and backplate, Sensors and Actuators A, 40 (1994) 179-186.
    • (1994) Sensors and Actuators A , vol.40 , pp. 179-186
    • Scheeper, P.R.1    Olthuis, W.2    Bergveld, P.3
  • 14
    • 47249118568 scopus 로고
    • Mechanical limitations in the performance of integrated acoustic sensors
    • R.N. Tait and A.W. Mitchell, Mechanical limitations in the performance of integrated acoustic sensors, Sensors and Actuators A, 41-42 (1994) 455-459.
    • (1994) Sensors and Actuators A , vol.41-42 , pp. 455-459
    • Tait, R.N.1    Mitchell, A.W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.