Transformation of surface structures on vicinal Si(111) during heating

Surface Science

Volumn 445, Issue 2-3, 2000, Pages 327-334

  Homma, Yoshikazu ^a   Hibino, Hiroki ^a   Kunii, Yasuo ^a   Ogino, Toshio ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL ATOMIC STRUCTURE; DIFFUSION; ELECTRIC HEAT TREATMENT; EVAPORATION; HOLE TRAPS; MORPHOLOGY; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; SUBLIMATION; SURFACE ROUGHNESS; SURFACE STRUCTURE;

ADATOM DIFFUSION; STEP FLOW SUBLIMATION; VICINAL SURFACES;

SEMICONDUCTING SILICON;

EID: 0033908091     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)01074-2     Document Type: Article

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