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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 3, 1997, Pages 1345-1350

Atomic step distributions on annealed periodic Si(001) gratings

(5) Tanaka, S a Limbach, C C a Blakely, J M a Tromp, R M b Mankos, M b

a Cornell University (United States)

b IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

2D GRATING; ANNEALING TEMPERATURES; ATOMIC STEP; IN-SITU; LOW ENERGY ELECTRON MICROSCOPY; MICROSCOPIC STRUCTURES; ROOM TEMPERATURE; SI(0 0 1); SQUARE-WAVE; SURFACE PROFILES; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE;

ANNEALING; ATOMIC FORCE MICROSCOPY; MORPHOLOGY; SILICON; SOIL CONSERVATION; TEMPERATURE; THERMODYNAMICS;

TWO DIMENSIONAL;

EID: 0000633445 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.580587 Document Type: Article

Times cited : (28)

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