Sublimation of a heavily boron-doped Si(111) surface

Physical Review B - Condensed Matter and Materials Physics

Volumn 58, Issue 19, 1998, Pages 13146-13150

  Homma, Yoshikazu ^a   Hibino, Hiroki ^a   Ogino, Toshio ^a   Aizawa, Noriyuki ^b  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

^b TOKYO GAKUGEI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000614612     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.58.13146     Document Type: Article

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