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Volumn 55, Issue 16, 1997, Pages R10237-R10240
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Sublimation of the Si(111) surface in ultrahigh vacuum
a b b
a
NTT CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0000404887
PISSN: 10980121
EISSN: 1550235X
Source Type: Journal
DOI: 10.1103/PhysRevB.55.R10237 Document Type: Article |
Times cited : (76)
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References (24)
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