Development of the scanning atom probe and atomic level analysis

Materials Characterization

Volumn 44, Issue 1-2, 2000, Pages 29-57

  Nishikawa, Osamu ^a   Ohtani, Yoshikatsu ^a   Maeda, Kiyoshi ^a   Watanabe, Masafumi ^a   Tanaka, Keiji ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC FIELDS; ELECTRODES; HYDROGEN; MASS SPECTROMETERS; OXYGEN; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACES; SYNTHETIC DIAMONDS;

APEX; ATOMIC LEVEL ANALYSIS; FIELD EVAPORATION; FUNNEL SHAPED SCANNING MICROEXTRACTION ELECTRODE; MICROCUSPS; SCANNING ATOM PROBE; SILICON MICROTIPS;

ION MICROSCOPES;

EID: 0033907575     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1044-5803(99)00046-7     Document Type: Article

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