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Volumn 69, Issue , 2000, Pages 188-193
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Current transient analysis of the oxidizing process in the complete anodic regime of the Si-HF system
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Author keywords
[No Author keywords available]
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Indexed keywords
CURRENT VOLTAGE CHARACTERISTICS;
ELECTROCHEMISTRY;
ELECTRODES;
OXIDATION;
POROUS SILICON;
REACTION KINETICS;
TRANSIENTS;
CURRENT TRANSIENT ANALYSIS;
SEMICONDUCTING SILICON;
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EID: 0033874836
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/S0921-5107(99)00259-7 Document Type: Article |
Times cited : (22)
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References (14)
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