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Volumn 199, Issue 2, 2000, Pages 130-140
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Transmission electron microscopy of semiconductor quantum dots
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Author keywords
Ge Si; InAs GaAs; Phase amplitude diagram; Quantum dots; Semiconductor heterostuctures; Shape measurement; Size measurement; Strain contrast; Strain measurement; Suppressed diffraction imaging
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Indexed keywords
DIFFRACTION;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
III-V SEMICONDUCTORS;
INDIUM ARSENIDE;
NANOCRYSTALS;
SEMICONDUCTOR QUANTUM DOTS;
STRAIN MEASUREMENT;
DIFFRACTION IMAGING;
GE/SI;
INAS/GAAS;
PHASE-AMPLITUDE DIAGRAM;
QUANTUM DOT;
SEMICONDUCTOR HETEROSTUCTURES;
SHAPE MEASUREMENTS;
SIZE MEASUREMENTS;
STRAIN CONTRAST;
STRAINS MEASUREMENTS;
SUPPRESSED-DIFFRACTION IMAGING;
ASPECT RATIO;
ARSENIC;
GALLIUM;
GERMANIUM;
INDIUM;
SILICON;
ACCURACY;
ARTICLE;
DIFFRACTION;
PRIORITY JOURNAL;
SEMICONDUCTOR;
SIGNAL NOISE RATIO;
TRANSMISSION ELECTRON MICROSCOPY;
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EID: 0033859596
PISSN: 00222720
EISSN: None
Source Type: Journal
DOI: 10.1046/j.1365-2818.2000.00729.x Document Type: Article |
Times cited : (19)
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References (19)
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