Enhanced diffusion in silicon processing

MRS Bulletin

Volumn 25, Issue 6, 2000, Pages 39-44

  Cowern, Nicholas ^a   Rafferty, Conor ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DIFFUSION IN SOLIDS; INTEGRATED CIRCUIT MANUFACTURE; ION IMPLANTATION; LOW TEMPERATURE PRODUCTION; POINT DEFECTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING;

DOPANT DIFFUSION; TRANSIENT ENHANCED DIFFUSION (TED);

SEMICONDUCTING SILICON;

EID: 0033738477     PISSN: 08837694     EISSN: None     Source Type: Journal    
DOI: 10.1557/mrs2000.97     Document Type: Article

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