Nano-lithography with atoms

Surface Science

Volumn 433, Issue , 1999, Pages 40-47

  Bell, A S ^a   Brezger, B ^a   Drodofsky, U ^a   Nowak, S ^a   Pfau, T ^a   Stuhler, J ^a   Schulze, Th ^a   Mlynek, J ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALI METALS; ATOMIC FORCE MICROSCOPY; ATOMS; CHROMIUM; DEPOSITION; ELECTRON OPTICS; INERT GASES; INTERFEROMETRY; NANOTECHNOLOGY; QUANTUM OPTICS;

ATOM BEAMS; ATOM LITHOGRAPHY; DE BROGLIE WAVELENGTH; OPTICAL LITHOGRAPHY SYSTEMS; PLANCK CONSTANT;

ION BEAM LITHOGRAPHY;

EID: 0033349263     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00083-7     Document Type: Article

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