In-situ detection of stress in oxide films during Si electrodissolution in acidic fluoride electrolytes

Journal of Electroanalytical Chemistry

Volumn 474, Issue 2, 1999, Pages 182-187

  Cattarin, Sandro ^a   Decker, Franco ^b   Dini, Danilo ^c   Margesin, Benno ^d  

^a CNR   (Italy)

^b SAPIENZA UNIVERSITY OF ROME   (Italy)

^c FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^d ITC IRST   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DISSOLUTION; ELASTIC MODULI; ELECTROCHEMISTRY; ELECTROSTRICTION; MATHEMATICAL MODELS; OXIDES; SILICON; STRESS ANALYSIS; SURFACE TENSION;

BENDING BEAM METHOD (BBM); ELECTRODISSOLUTION; STONEY'S EQUATION;

ELECTROCHEMICAL ELECTRODES;

EID: 0033334943     PISSN: 00220728     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(99)00348-4     Document Type: Article

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