Wettability of polished silicon oxide surfaces

Journal of the Electrochemical Society

Volumn 143, Issue 2, 1996, Pages 643-648

  Thomas, Richard R ^a   Kaufman, Frank B ^b,c   Kirleis, Juergen T ^b   Belsky, Richard A ^b  

^a DUPONT COMPANY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c CABOT MICROELECTRONICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ANGLE MEASUREMENT; CHEMICAL POLISHING; CONTACT ANGLE; DEHYDRATION; HYSTERESIS; SILICON WAFERS; SURFACE TENSION; SURFACES; WETTING;

CHEMOMECHANICAL POLISHING; DRY NITROGEN; HYDROPHOBICITY; MECHANICAL INTERACTIONS; SILANOL; SUBMERSION; WETTABILITY;

SILICA;

EID: 0030082137     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836494     Document Type: Article

References (38)

1. 2 Interface, p. 139, Plenum, New York (1988).
2. D. E. Aspnes and J. B. Theeton, Phys. Rev. Lett., 43, 1046 (1979).
3. E. A. Irene, This Journal, 127, 2722 (1978).
4. Semicond. Int., 72 (May 1993).
5. E. D. Palik, H. F. Gray, and P. B. Klein, This Journal, 130, 956 (1983).
6. E. D. Palik, V. M. Bermudez, and O. J. Glembocki, ibid., 132, 871 (1985).
7. E. D. Palik, O. J. Glembocki, and I. Heard, Jr., ibid., 134, 404 (1987).
8. L. M. Cook, J. Non-Cryst. Solids, 120, 152 (1990).
9. R. N. Lamb and D. N. Furlong, J. Chem. Soc., Farady Trans, 1, 78, 61 (1982).
10. H. Dunken, J. Non-Cryst. Solids, 129, 64 (1991).
11. H. Yanazawa, T. Matsuzawa, and N. Hashimoto, J. Adhesion Sci. Technol., 4, 145 (1990).
12. G. M. Nishioka and J. A. Schramke, J. Colloid Interface Sci., 105, 102 (1985).
13. B. B. Sauer and T. E. Carney, Langmuir, 6, 1002 (1990).
14. W. L. C. M. Heyboer, G. A. C. M. Spierings, and J. E. A. M. van den Meerakker, This Journal, 138, 774 (1991).
15. A. W. Adamson, The Physical Chemistry of Surfaces, p. 342, 4th ed., Wiley, New York (1982).
16. W. Reuter, S. L. Cohen, and F. B. Kaufman, Unpublished results.
17. H. Yanazawa, T. Matsuzawa, and N. Hashimoto, J. Adhesion Sci. Technol., 4, 145 (1990).
18. G. J. Pietsch, G. S. Higashi, and Y. J. Chabal, Appl. Phys. Lett., 64, 3115 (1994).
19. W. A. Zisman, in Contact Angle Wettability and Adhesion, Advances in Chemistry Series No. 43, American Chemical Society, Washington, DC (1964).
20. R. E. Baier and W. A. Zisman, Macromolecules, 3, 70 (1970).
21. R. E. Baier and W. A. Zisman, ibid., 3, 462 (1970).
22. R. E. Johnson, Jr., and R. H. Dettre, in Wettability, pp. 1-73, Marcel Dekker, Inc., New York (1993).
23. F. Chen and W. V. Chang, Langmuir, 7, 2401 (1991).
24. F. M. Fowkes, F. L. Riddle, Jr., W. E. Pastore, and A. A. Weber, Colloids Surf., 43, 367 (1990).
25. M. Grundner, J. Vac. Sci. Technol., A5, 2011 (1987).
26. V. Bolis, B. Fubini, L. Marchese, G. Martra, and D. Costa, J. Chem. Soc., Faraday Trans., 87, 497 (1991).
27. C. J. Brinker, E. P. Roth, G. W. Scherer, and D. R. Tallant, J. Non-Cryst. Solids, 71, 171 (1985).
28. G. Ligner, A. Vidai, H. Balard, and E. Papirer, J. Colloid Interface Sci., 120, 26 (1990).
29. G. J. Young, J. Colloid Sci., 13, 67 (1958).
30. G. J. Young and T. P. Bush, ibid., 15, 361 (1960).
31. R. E. Johnson, Jr. and R. H. Dettre, in Surface and Colloid Science, Vol. 2, E. Matijevic, Editor, pp. 85-153, Wiley, New York (1969).
32. E. Bayramli, T. G. M. van de Ven, and S. G. Mason, Can. J. Chem., 59, 1954 (1981).
33. E. Bayramli and S. G. Mason, ibid., 59, 962 (1981).
34. J. N. Israelachvili and M. L. Gee, Langmuir, 5, 288 (1989).
35. A. B. D. Cassie, Discuss. Farady Soc., 75, 5041 (1952).
36. B. Bhushan, S. P. Murarka, and J. Gerlach, J. Vac. Sci. Technol., B8, 1068 (1990).
37. M. Weling and C. Drill, Abstract 334, p. 502, The Electrochemical Society Extended Abstracts, Vol. 95-1, Reno, NV, May 21-26, 1995.
38. C. Huh and S. G. Mason, J. Colloid Interface Sci., 60, 11 (1977).