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Volumn 143, Issue 4, 1996, Pages 1313-1318
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On the origin of electrochemical oscillations at silicon electrodes
a
a
SIEMENS AG
(Germany)
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Author keywords
[No Author keywords available]
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Indexed keywords
ANODIC OXIDATION;
ATOMIC FORCE MICROSCOPY;
ELECTROCHEMISTRY;
ELECTROLYTES;
ELLIPSOMETRY;
HYDROFLUORIC ACID;
MODELS;
MORPHOLOGY;
OSCILLATIONS;
OXIDES;
SEMICONDUCTING SILICON;
STRESSES;
ELECTROCHEMICAL OSCILLATIONS;
SILICON ELECTRODES;
STRUCTURAL TRANSITION;
THIN ANODIC OXIDE;
X RAY REFLECTOMETRY;
ELECTROCHEMICAL ELECTRODES;
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EID: 0030127993
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1836636 Document Type: Article |
Times cited : (96)
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References (22)
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