"Self-thickness-limited" plasma polymerization of an ultrathin antiadhesive film

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 6, 1996, Pages 3043-3048

  Groning P ^a   Schneuwly, A ^a   Schlapbach, L ^a   Gale, M T ^b  

^a UNIVERSITY OF FRIBOURG   (Switzerland)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; ETCHING; FLUOROCARBONS; INTERFACIAL ENERGY; PLASMA APPLICATIONS; PLASTIC FILMS; POLYCARBONATES; POLYMERIZATION; SEMICONDUCTOR PLASMAS; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL STABILITY; CONTACT ANGLE MEASUREMENT; DIFFRACTIVE OPTICAL ELEMENTS; FILM THICKNESS; FLUORINATION; FLUOROCARBON DISCHARGES; HOT EMBOSSING REPLICATION TESTS; PLASMA POLYMERIZATION; POLYCARBONATE SHEED; ULTRATHIN ANTIADHESIVE FILMS;

ULTRATHIN FILMS;

EID: 0030284740     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580169     Document Type: Article

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