A Direct Approach for Evaluating the Thermal Condition of a Silicon Substrate under Infrared Rays and Specular Reflectors

Journal of the Electrochemical Society

Volumn 146, Issue 2, 1999, Pages 713-718

  Habuka, Hitoshi ^a   Otsuka, Toru ^a   Mayusumi, Masanori ^a   Shimada, Manabu ^b   Okuyama, Kikuo ^b  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INCANDESCENT LAMPS; INFRARED RADIATION; MATHEMATICAL MODELS; MIRRORS; SEMICONDUCTING SILICON; SUBSTRATES;

RAPID THERMAL PROCESSING; STEFAN-BOLTZMANN LAW; THREE-DIMENSIONAL RAY TRACING SIMULATION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033077873     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391669     Document Type: Article

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