Haze generation on silicon surface heated in hydrogen ambient at atmospheric pressure

Journal of the Electrochemical Society

Volumn 144, Issue 9, 1997, Pages 3261-3265

  Habuka, Hitoshi ^a   Otsuka, Toru ^a   Katayama, Masatake ^a  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; HYDROGEN; MOISTURE; QUARTZ; SILICA; SILICON CARBIDE; SURFACE ROUGHNESS; SURFACES; THERMAL EFFECTS; THERMAL GRADIENTS;

DRY SYSTEM; HAZE GENERATION; SURFACE PIT FORMATION;

SILICON WAFERS;

EID: 0031235061     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837994     Document Type: Article

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