Temperature monitoring by ripple pyrometry in rapid thermal processing

Materials Research Society Symposium - Proceedings

Volumn 429, Issue , 1996, Pages 291-296

  Nguyenphu, Binh ^a   Oh, Minseok ^a   Fiory, Anthony T ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; MONITORING; SILICON WAFERS; STATISTICAL METHODS; SURFACES; TEMPERATURE CONTROL; TEMPERATURE MEASUREMENT; VLSI CIRCUITS;

RAPID THERMAL PROCESSING; RIPPLE PYROMETRY; TEMPERATURE MONITORING;

PYROMETRY;

EID: 0030411344     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-429-291     Document Type: Conference Paper

References (6)