Recent advances in the theory of oxide-semiconductor interfaces

Microelectronics Reliability

Volumn 39, Issue 1, 1999, Pages 3-14

  Edwards, Arthur H ^a,c   Fowler, W Beall ^b  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b LEHIGH UNIVERSITY   (United States)

^c UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PROPERTIES OF SOLIDS; INTERFACES (MATERIALS); OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE SEMICONDUCTOR INTERFACES;

SEMICONDUCTOR MATERIALS;

EID: 0032685812     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(98)00205-4     Document Type: Article

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