Theory of defects and defect processes in silicon dioxide

Journal of Non-Crystalline Solids

Volumn 222, Issue , 1997, Pages 33-41

  Fowler, W Beall ^a   Edwards, A H ^a  

^a LEHIGH UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; DEFECTS; DIFFUSION IN SOLIDS; ELECTRONIC STRUCTURE; HYDROGEN; MATHEMATICAL MODELS; MOS DEVICES; NITROGEN; THIN FILMS;

ATOMIC RELAXATIONS;

SILICA;

EID: 0031550083     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00350-5     Document Type: Article

References (36)