Coupled-barrier diffusion: The case of oxygen in silicon

Physical Review Letters

Volumn 76, Issue 2, 1996, Pages 267-270

  Ramamoorthy, Madhavan ^a   Pantelides, Sokrates T ^a  

^a VANDERBILT UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000995024     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.76.267     Document Type: Article

References (15)

1. J. W. Corbett, R. S. Mac Donald, and G. D. Watkins, J. Phys. Chem. Solids 25, 873 (1964).
2. E. Martinez, J. Plans, and F. Yndurain, Phys. Rev. B 36, 8043 (1987).
3. J. C. Mikkelsen, Jr., Appl. Phys. Lett. 40, 336 (1982).
4. L. C. Snyder and J. W. Corbett, Mater. Res. Soc. Symp. Proc. 59, 207 (1986).
5. P. J. Kelly and R. Car, Phys. Rev. B 45, 6543 (1992).
6. M. Saito and A. Oshiyama, Phys. Rev. B 38, 10 711 (1988).
7. A. Oshiyama and M. Saito, in Defect Control in Semiconductors, K. Sumino (Elsevier Science Publishers, North-Holland, Amsterdam, 1990).
8. M. Needels, J. D. Joannopoulos, Y. Bar-Yam, S. T. Pantelides, and R. H. Wolfe, Mater. Res. Soc. Symp. Proc. 209, 103 (1991).
9. Z. Jiang and R. A. Brown, Phys. Rev. Lett. 74, 2046 (1995).
10. D. M. Ceperley and B. J. Alder, Phys. Rev. Lett. 45, 566 (1980).
11. D. Vanderbilt, Phys. Rev. B 41, 7892 (1990).
12. R. D. King-Smith and D. Vanderbilt, Phys. Rev. B 49, 5828 (1994). Smith
13. Feng Liu, S. H. Garofalini, R. D. King-Smith, and D. Vanderbilt, Phys. Rev. B 49, 12 528 (1994).
14. M. Ramamoorthy, D. Vanderbilt, and R. D. King-Smith, Phys. Rev. B 49, 16 721 (1994).
15. D. J. Chadi and M. L. Cohen, Phys. Rev. B 8, 5747 (1973).