Fatigue-free Pb(Zr0.52Ti0.48)O3 thin films on indium tin oxide coated substrates by a sol-gel process

Applied Physics A: Materials Science and Processing

Volumn 69, Issue 1, 1999, Pages 93-96

  Zeng, J ^a   Lin, C ^a   Li, K ^b   Li, J ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b CHANGZHOU UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; FATIGUE OF MATERIALS; FERROELECTRIC MATERIALS; FERROELECTRICITY; GLASS; LEAD COMPOUNDS; MORPHOLOGY; PEROVSKITE; RAPID THERMAL ANNEALING; SEMICONDUCTING INDIUM COMPOUNDS; SOL-GELS; THIN FILMS;

INDIUM TIN OXIDE; LEAD ZIRCONATE TITANATE;

DIELECTRIC FILMS;

EID: 0032661845     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050977     Document Type: Article

References (32)

1. J. Chen, K.R. Udayakumar, K.G. Brooks, L.E. Cross: J. Appl. Phys. 71, 4465 (1992)
2. J.F. Scott, C.A. Paz de Araujo, B.M. Melink, L.D. Macmillan, R. Zuleeg: J. Appl. Phys. 70, 382 (1991)
3. G.H. Heartling: J. Vac. Sci. Technol. A 9, 414 (1991)
4. A.I. Kingon, S.K. Streiffer, C. Basceri, S.R. Summerfelt: MRS Bull. 21, 46 (1996)
5. I.K. Yoo, S.B. Desu, J. Xing: Mater. Res. Soc. Symp. Proc. 310, 165 (1993)
6. H.N. Al-Shareef, O. Auciello, A.I. Kingon: J. Appl. Phys. 77, 2146 (1995)
7. K. Aoki, Y. Fukuda: Jpn. J. Appl. Phys. Lett. 36, L1195 (1997)
8. S.B. Majumder, Y.N. Mohapatra, D.C. Agrawal: J. Mater. Sci. 32, 2141 (1997)
9. J.T. Cheung, P.E. Morgan, D.H. Lowndes, X.Y. Zhang, J. Breen: Appl. Phys. Lett. 62, 2045 (1993)
10. S.D. Bernstein, T.Y. Wong, Y. Kisler, R.W. Tustison: J. Mater. Res. 8, 12 (1992)
11. H.N. Al-Shareef, B.A. Tuttle, W.L. Warren, D. Dimos, M.V. Raymond, M.A. Rodriguez: Appl. Phys. Lett. 68, 272 (1996)
12. K. Kushida-Abdelghhafar, H. Miki, F. Yano, Y. Fujisaki: Jpn. J. Appl. Phys. Lett. 36, L1032 (1997)
13. C.H. Ahn, J.M. Triscone, N. Archibald, M. Decroux, R.H. Hammond, T.H. Geballe, Q. Fischer, M.R. Beasley: Science 269, 373 (1995)
14. P. Sun, T. Sun, C.R. Wu, Y.X. Li: Ferroelectrics 195, 249 (1997)
15. S.H. Kim, C.E. Kim, Y.J. Oh: Thin Solid Films 305, 321 (1997)
16. T.C. Chen, C.L. Thio, S.B. Desu: J. Mater. Res. 12, 2628 (1997)
17. S.B. Desu, P.C. Joshi, X. Zhang, S.O. Ryu: Appl. Phys. Lett. 71, 1041 (1997)
18. S.H. Lim, Y.S. Choi, C.E. Kim: J. Mater. Res. 12, 1576 (1997)
19. C.B. Eom, R.B. Van Dover, J.M. Phillips, D.J. Werder, J.H. Marshall, C.H. Chen, R.J. Cava, R.M. Fleming, D.K. Fork: Appl. Phys. Lett. 63, 2570 (1993)
20. J. Lee, L. Johson, A. Safar, R. Ramesh, T. Sands, H. Gilchrist, V.G. Keramidas: Appl. Phys. Lett. 63, 27 (1993)
21. R. Ramesh, A. Inam, B. Wilkens, W.K. Chan, D.L. Hart, K. Luther, J.M. Tarascon: Science 252, 944 (1991)
22. S. Sadashivan, S. Aggarwal, T.K. Song, R. Ramesh: J. Appl. Phys. 83, 2165 (1998)
23. R. Dat, D.J. Lichtenwalner, O. Auciello, A.I. Kingon: Appl. Phys. Lett. 64, 2673 (1994)
24. L.J. Meng, M.P. dos Santos: Thin Solid Films 303, 151 (1997)
25. K. Ishibashi, K. Watabe, N. Hosokawa: Thin Solid Films 281, 198 (1996)
26. L.D. Madsen, L. Weaver: J. Electron. Mater. 21, 93 (1992)
27. A.V. Rao, S.A. Mansour, A.L. Bement: Mater. Lett. 29, 255 (1996)
28. J.M. Zeng, S.G. Song, L.W. Wang, M. Zhang, L.R. Zheng, C.L. Lin: J. Am. Ceram. Soc. 82, 461 (1999)
29. K. Ijima, Y. Tomita, R. Takayama, I. Ueda: J. Appl. Phys. 60, 361 (1986)
30. C. Lee, S. Kawaro, T. Itoh, T. Suga: J. Mater. Sci. 31, 4559 (1996)
31. C.B. Eom, R.B. Van Dover, J.M. Philips, D.J. Werder, J.H. Marshall: Appl. Phys. Lett. 63, 2570 (1993)
32. T. Nakamura, Y. Nakao, A. Kamisawa, H. Takasu: Jpn. J. Appl. Phys. 34, 5184 (1995)