Large area deposition of ITO films by cluster type sputtering system

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 198-201

  Ishibashi, Keiji ^a   Watabe, Kazufumi ^a   Hosokawa, Naokichi ^a  

^a ANELVA Corporation ^*  (Japan)

Author keywords

Deposition process; Indium oxide; Sputtering

Indexed keywords

ARGON; ELECTRIC CONDUCTIVITY; ELECTRIC DISCHARGES; ELECTRIC RESISTANCE; FILM PREPARATION; INDIUM COMPOUNDS; OPACITY; OXYGEN; SPUTTER DEPOSITION; STATISTICAL METHODS; SUBSTRATES; TEMPERATURE;

CLUSTER TYPE SPUTTERING SYSTEM; INDIUM TIN OXIDE; RESPONSE SURFACE METHODOLOGY; SHEET RESISTANCE; SPECIFIC RESISTIVITY;

CONDUCTIVE FILMS;

EID: 0030218381     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08612-9     Document Type: Article

References (3)

1. G.E.P. Box, W.G. Hunter and J.S. Hunter, Statistics for Experimenters, Wiley, New York, 1978.
2. G.E.P. Box and N.R. Draper, Empirical Model-Building and Response Surfaces, Wiley, New York, 1987.
3. K. Ishibashi and Y. Shiokawa, Proc. 3rd ISSP, Tokyo, 1995, p. 423.